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"Study of Nanosecond Laser Annealing on Silicon Doped Hafnium Oxide Film ..."

Tarek Ali et al. (2022)

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DOI: 10.1109/IMW52921.2022.9779281

access: closed

type: Conference or Workshop Paper

metadata version: 2024-01-19

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  - conf/imw2/AliOKLLSRSPKCRH22
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  - https://dblp.org/rec/conf/imw2/AliOKLLSRSPKCRH22
Tarek Ali, Ricardo Olivo, S. Kerdilès, David Lehninger, Maximilian Lederer, D. Sourav, A.-S. Royet, Ayse Sünbül, A. Prabhu, Kati Kühnel, Malte Czernohorsky, M. Rudolph, R. Hoffmann, Christelle Charpin-Nicolle, Laurent Grenouillet, Thomas Kämpfe, Konrad Seidel:
Study of Nanosecond Laser Annealing on Silicon Doped Hafnium Oxide Film Crystallization and Capacitor Reliability. IMW 2022: 1-4

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