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"Negative bias temperature instability caused by plasma induced damage in ..."

Ryo Kishida, Azusa Oshima, Kazutoshi Kobayashi (2015)

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DOI: 10.1109/IRPS.2015.7112780

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-21

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  dblp key:
  - conf/irps/KishidaOK15
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Ryo Kishida, Azusa Oshima, Kazutoshi Kobayashi:
Negative bias temperature instability caused by plasma induced damage in 65 nm bulk and Silicon on thin BOX (SOTB) processes. IRPS 2015: 2

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