"Investigation of data pattern effects on nitride charge lateral migration ..."

Y. H. Liu et al. (2018)

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DOI: 10.1109/IRPS.2018.8353632

access: closed

type: Conference or Workshop Paper

metadata version: 2019-01-22

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Y. H. Liu, H. Y. Lin, C. M. Jiang, Tahui Wang, W. J. Tsai, T. C. Lu, K. C. Chen, Chih-Yuan Lu:
Investigation of data pattern effects on nitride charge lateral migration in a charge trap flash memory by using a random telegraph signal method. IRPS 2018: 6

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