"TDDB Reliability in Gate-All-Around Nanosheet."

Huimei Zhou et al. (2021)

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DOI: 10.1109/IRPS46558.2021.9405204

access: closed

type: Conference or Workshop Paper

metadata version: 2023-06-28

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Huimei Zhou, Miaomiao Wang, Ruqiang Bao, Tian Shen, Ernest Y. Wu, Richard G. Southwick, Jingyun Zhang, Veeraraghavan S. Basker, Dechao Guo:
TDDB Reliability in Gate-All-Around Nanosheet. IRPS 2021: 1-6

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