"Endpoint Detection of SiO2 Plasma Etching Using Expanded Hidden ..."

Sung-Ik Jeon et al. (2010)

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DOI: 10.1007/978-3-642-13318-3_58

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-19

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Sung-Ik Jeon, Seung-Gyun Kim, Sang Jeen Hong, Seung Soo Han:
Endpoint Detection of SiO₂ Plasma Etching Using Expanded Hidden Markov Model. ISNN (2) 2010: 464-471

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