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"Process-tolerant III-V/Si Membrane Distributed Reflector Lasers and ..."
Koji Takeda et al. (2024)
- Koji Takeda, Takuro Fujii, Yoshiho Maeda, Toru Segawa, Shinji Matsuo:

Process-tolerant III-V/Si Membrane Distributed Reflector Lasers and 50-Gb/s Direct Modulation at 80°C. OFC 2024: 1-3

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