"Fabrication Tolerance and Optimal Design of Spectral Sensitivities for ..."

Shuxue Quan et al. (2001)

> Home

Details and statistics

DOI: —

access: unavailable

type: Conference or Workshop Paper

metadata version: 2014-07-15

- no documents available
- export record
  dblp key:
  - conf/pics/QuanORK01
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/pics/QuanORK01
Shuxue Quan, Noboru Ohta, Mitchell R. Rosen, Naoya Katoh:
Fabrication Tolerance and Optimal Design of Spectral Sensitivities for Color Imaging Devices. PICS 2001: 277-282

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.