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"Process-induced skew variation for scaled 2-D and 3-D ICs."

Hu Xu, Vasilis F. Pavlidis, Giovanni De Micheli (2010)

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DOI: 10.1145/1811100.1811107

access: closed

type: Conference or Workshop Paper

metadata version: 2022-08-11

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  dblp key:
  - conf/slip/XuPM10
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Hu Xu, Vasilis F. Pavlidis, Giovanni De Micheli:
Process-induced skew variation for scaled 2-D and 3-D ICs. SLIP 2010: 17-24

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