"Unveiling Cryogenic Performance (4 to 300 K) Towards Ultra-Thin ..."

Dong Zhang et al. (2024)

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DOI: 10.1109/VLSITECHNOLOGYANDCIR46783.2024.10631318

access: closed

type: Conference or Workshop Paper

metadata version: 2025-03-03

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Dong Zhang, Yang Feng, Zijie Zheng, Chen Sun, Qiwen Kong, Gan Liu, Zuopu Zhou, Gengchiau Liang, Kai Ni, Jixuan Wu, Jiezhi Chen, Xiao Gong:
Unveiling Cryogenic Performance (4 to 300 K) Towards Ultra-Thin Ferroelectric HZO: Novel Kinetic Barrier Engineering and Underlying Mechanism. VLSI Technology and Circuits 2024: 1-2

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