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"Development of a Lithography Simulation Tool Set in Various Optical ..."

Masaki Kuramochi et al. (2024)

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DOI: 10.1109/ACCESS.2024.3390936

access: open

type: Journal Article

metadata version: 2024-05-17

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Masaki Kuramochi, Yukihide Kohira, Hiroyoshi Tanabe, Tetsuaki Matsunawa, Chikaaki Kodama:
Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization. IEEE Access 12: 58490-58501 (2024)

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