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"Optimal control of the wafer temperatures in diffusion/LPCVD reactors."

H. De Waard, Willem L. De Koning (1992)

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DOI: 10.1016/0005-1098(92)90112-S

access: closed

type: Journal Article

metadata version: 2020-02-20

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  - https://dblp.org/rec/journals/automatica/WaardK92
H. De Waard, Willem L. De Koning:
Optimal control of the wafer temperatures in diffusion/LPCVD reactors. Autom. 28(2): 243-253 (1992)

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