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"Low-temperature chemical vapor deposition processes and dielectrics for ..."

Donna R. Cote et al. (1995)

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DOI: 10.1147/RD.394.0437

access: closed

type: Journal Article

metadata version: 2020-03-13

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  - https://dblp.org/rec/journals/ibmrd/CoteNCPSP95
Donna R. Cote, Son Van Nguyen, William J. Cote, Scott L. Pennington, Anthony K. Stamper, Dragan V. Podlesnik:
Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM. IBM J. Res. Dev. 39(4): 437-464 (1995)

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