"Plasma-based dry etching techniques in the silicon integrated circuit ..."

Gottlieb S. Oehrlein, John F. Rembetski (1992)

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DOI: 10.1147/RD.362.0140

access: closed

type: Journal Article

metadata version: 2020-03-13

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Gottlieb S. Oehrlein, John F. Rembetski:
Plasma-based dry etching techniques in the silicon integrated circuit technology. IBM J. Res. Dev. 36(2): 140-157 (1992)

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