"Investigation of Cu ion drift through CVD TiSiN into SiO2 under bias ..."

Takashi Kawanoue et al. (2005)

> Home

Details and statistics

DOI: 10.1587/ELEX.2.254

access: open

type: Journal Article

metadata version: 2021-02-12

- view
  - electronic edition via DOI (open access)
  authority control:
- export record
  dblp key:
  - journals/ieiceee/KawanoueOHY05
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/ieiceee/KawanoueOHY05
Takashi Kawanoue, Seiichi Omoto, Masahiko Hasunuma, Takashi Yoda:
Investigation of Cu ion drift through CVD TiSiN into SiO2 under bias temperature stress conditions. IEICE Electron. Express 2(7): 254-259 (2005)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.