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"A Fast Mask Manufacturability and Process Variation Aware OPC Algorithm ..."

Ahmed Awad, Atsushi Takahashi, Chikaaki Kodama (2016)

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DOI: 10.1587/TRANSFUN.E99.A.2363

access: closed

type: Journal Article

metadata version: 2023-06-26

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  persistent URL:
  - https://dblp.org/rec/journals/ieicet/AwadTK16
Ahmed Awad, Atsushi Takahashi, Chikaaki Kodama:
A Fast Mask Manufacturability and Process Variation Aware OPC Algorithm with Exploiting a Novel Intensity Estimation Model. IEICE Trans. Fundam. Electron. Commun. Comput. Sci. 99-A(12): 2363-2374 (2016)

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