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"Selective Use of Stitch-Induced Via for V0 Mask Reduction: Standard Cell ..."

Daijoon Hyun, Younggwang Jung, Youngsoo Shin (2019)

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DOI: 10.1587/TRANSFUN.E102.A.1711

access: closed

type: Journal Article

metadata version: 2021-01-18

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  dblp key:
  - journals/ieicet/HyunJS19
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  persistent URL:
  - https://dblp.org/rec/journals/ieicet/HyunJS19
Daijoon Hyun, Younggwang Jung, Youngsoo Shin:
Selective Use of Stitch-Induced Via for V0 Mask Reduction: Standard Cell Design and Placement Optimization. IEICE Trans. Fundam. Electron. Commun. Comput. Sci. 102-A(12): 1711-1719 (2019)

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