Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Verification of the Effectiveness of UV-Polishing for 4H-SiC Wafer Using ..."

Takeshi Tanaka, Masaru Takizawa, Akihiro Hata (2018)

> Home

Details and statistics

DOI: 10.20965/IJAT.2018.P0160

access: closed

type: Journal Article

metadata version: 2020-07-09

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/ijat/TanakaTH18
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/ijat/TanakaTH18
Takeshi Tanaka, Masaru Takizawa, Akihiro Hata:
Verification of the Effectiveness of UV-Polishing for 4H-SiC Wafer Using Photocatalyst and Cathilon. Int. J. Autom. Technol. 12(2): 160-169 (2018)

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.