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"Fast Level-Set-Based Inverse Lithography Algorithm for Process Robustness ..."

Zhen Geng et al. (2015)

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DOI: 10.1007/S11390-015-1549-7

access: closed

type: Journal Article

metadata version: 2023-07-28

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Zhen Geng, Zheng Shi, Xiaolang Yan, Kai-sheng Luo, Weiwei Pan:
Fast Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement and Its Application. J. Comput. Sci. Technol. 30(3): 629-638 (2015)

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