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"Thickness dependent dielectric breakdown of PECVD low-k carbon doped ..."

H. Zhou, F. G. Shi, B. Zhao (2003)

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DOI: 10.1016/S0026-2692(03)00006-5

access: closed

type: Journal Article

metadata version: 2020-02-22

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H. Zhou, F. G. Shi, B. Zhao:
Thickness dependent dielectric breakdown of PECVD low-k carbon doped silicon dioxide dielectric thin films: modeling and experiments. Microelectron. J. 34(4): 259-264 (2003)

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