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"Verification and reduction of surface charging during high/medium current ..."

C. Cantin, G. Gove, G. Polisski (2009)

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DOI: 10.1016/J.MICROREL.2008.10.015

access: closed

type: Journal Article

metadata version: 2020-02-22

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C. Cantin, G. Gove, G. Polisski:
Verification and reduction of surface charging during high/medium current implantations by implementing plasma damage monitoring. Microelectron. Reliab. 49(2): 215-220 (2009)

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