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"Oxide reliability below 3 nm for advanced CMOS: Issues, characterization, ..."

Didier Goguenheim, D. Pic, Jean-Luc Ogier (2007)

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DOI: 10.1016/J.MICROREL.2007.07.048

access: closed

type: Journal Article

metadata version: 2020-02-22

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Didier Goguenheim, D. Pic, Jean-Luc Ogier:
Oxide reliability below 3 nm for advanced CMOS: Issues, characterization, and solutions. Microelectron. Reliab. 47(9-11): 1322-1329 (2007)

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