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"NBTI degradation effect on advanced-process 45 nm high-k PMOSFETs with ..."

Sharifah Wan Muhamad Hatta et al. (2010)

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DOI: 10.1016/J.MICROREL.2010.07.022

access: closed

type: Journal Article

metadata version: 2020-02-22

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Sharifah Wan Muhamad Hatta, Norhayati Soin, D. Abd Hadi, Jianfu Zhang:
NBTI degradation effect on advanced-process 45 nm high-k PMOSFETs with geometric and process variations. Microelectron. Reliab. 50(9-11): 1283-1289 (2010)

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