"Non-ideal effects improvement of SF6 plasma treated hafnium ..."

Tseng-Fu Lu et al. (2010)

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DOI: 10.1016/J.MICROREL.2010.01.029

access: closed

type: Journal Article

metadata version: 2023-09-30

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Tseng-Fu Lu, Jer-Chyi Wang, Chia-Ming Yang, Chung-Po Chang, Kuan-I Ho, Chi-Fong Ai, Chao-Sung Lai:
Non-ideal effects improvement of SF₆ plasma treated hafnium oxide film based on electrolyte-insulator-semiconductor structure for pH-sensor application. Microelectron. Reliab. 50(5): 742-746 (2010)

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