"Flat band voltage shift and oxide properties after rapid thermal annealing."

Barry J. O'Sullivan et al. (2001)

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DOI: 10.1016/S0026-2714(01)00073-7

access: closed

type: Journal Article

metadata version: 2021-06-14

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Barry J. O'Sullivan, Paul K. Hurley, F. N. Cubaynes, P. A. Stolk, F. P. Widdershoven:
Flat band voltage shift and oxide properties after rapid thermal annealing. Microelectron. Reliab. 41(7): 1053-1056 (2001)

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