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"Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices ..."
A. Pecora et al. (2005)
- A. Pecora, Luca Maiolo
, A. Bonfiglietti, M. Cuscunà, F. Mecarini, Luigi Mariucci
, Guglielmo Fortunato
, N. D. Young:
Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing. Microelectron. Reliab. 45(5-6): 879-882 (2005)
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