"Dielectric reliability of stacked ..."

J. Y. Seo et al. (2005)

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DOI: 10.1016/J.MICROREL.2005.07.021

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type: Journal Article

metadata version: 2020-02-22

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J. Y. Seo, K. J. Lee, S. Y. Lee, S. J. Hwang, C. K. Yoon:
Dielectric reliability of stacked Al₂O₃-HfO₂ MIS capacitors with cylinder type for improving DRAM data retention characteristics. Microelectron. Reliab. 45(9-11): 1360-1364 (2005)

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