default search action
"Electromigration behavior of dual-damascene Cu interconnects--Structure, ..."
A. V. Vairagar, S. G. Mhaisalkar, Ahila Krishnamoorthy (2004)
- A. V. Vairagar, S. G. Mhaisalkar, Ahila Krishnamoorthy:
Electromigration behavior of dual-damascene Cu interconnects--Structure, width, and length dependences. Microelectron. Reliab. 44(5): 747-754 (2004)
manage site settings
To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.