"Improvement of reliability for high-ohmic Cr-Si thin film resistors in a ..."

X. Y. Wang et al. (2016)

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DOI: 10.1016/J.MICROREL.2016.03.010

access: closed

type: Journal Article

metadata version: 2020-02-22

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X. Y. Wang, Q. Cheng, X. P. Ma, H. Zhang, M. X. Li, T. N. Chen, P. Zhang, J. Q. Shao:
Improvement of reliability for high-ohmic Cr-Si thin film resistors in a heat and humid environment: Removing moisture source by electrocatalytic decomposition of water. Microelectron. Reliab. 60: 101-108 (2016)

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