"Probing stress effects in HfO2 gate stacks with time dependent ..."

Chadwin D. Young et al. (2005)

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DOI: 10.1016/J.MICROREL.2004.11.043

access: closed

type: Journal Article

metadata version: 2021-10-14

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Chadwin D. Young, Gennadi Bersuker, Yuegang Zhao, Jeff J. Peterson, Joel Barnett, George A. Brown, Jang H. Sim, Rino Choi, Byoung Hun Lee, Peter Zeitzoff:
Probing stress effects in HfO₂ gate stacks with time dependent measurements. Microelectron. Reliab. 45(5-6): 806-810 (2005)

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