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"Enhancing Si3N4 Selectivity over SiO2 in Low-RF Power NF3-O2 Reactive Ion ..."

Nguyen Hoang Tung et al. (2024)

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DOI: 10.3390/S24103089

access: open

type: Journal Article

metadata version: 2024-06-18

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  - journals/sensors/TungLDKLEKK24
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  - https://dblp.org/rec/journals/sensors/TungLDKLEKK24
Nguyen Hoang Tung, Heesoo Lee, Duy Khoe Dinh, Dae-Woong Kim, Jin Young Lee, Geon Woong Eom, Hyeong-U. Kim, Woo Seok Kang:
Enhancing Si3N4 Selectivity over SiO2 in Low-RF Power NF3-O2 Reactive Ion Etching: The Effect of NO Surface Reaction. Sensors 24(10): 3089 (2024)

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