"Three-dimensional resist process simulator PEACE (photo and electron beam ..."

Yoshihiko Hirai et al. (1991)

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DOI: 10.1109/43.137508

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type: Journal Article

metadata version: 2020-09-24

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Yoshihiko Hirai, Sadafumi Tomida, Kazushi Ikeda, Masaru Sasago, Masayuki Endo, Sigeru Hayama, Noboru Nomura:
Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system). IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 10(6): 802-807 (1991)

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