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"Chemical-Mechanical Polishing-Aware Application-Specific 3D NoC Design."

Wooyoung Jang, David Z. Pan (2013)

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DOI: 10.1109/TCAD.2013.2237771

access: closed

type: Journal Article

metadata version: 2020-09-24

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Wooyoung Jang, David Z. Pan:
Chemical-Mechanical Polishing-Aware Application-Specific 3D NoC Design. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 32(6): 940-951 (2013)

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