"Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography."

Xu Ma et al. (2019)

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DOI: 10.1109/TCI.2018.2880342

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type: Journal Article

metadata version: 2025-01-19

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Xu Ma, Zhiqiang Wang, Xuanbo Chen, Yanqiu Li, Gonzalo R. Arce:
Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography. IEEE Trans. Computational Imaging 5(1): 120-135 (2019)

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