"Gate oxide leakage current analysis and reduction for VLSI circuits."

Dongwoo Lee, David T. Blaauw, Dennis Sylvester (2004)

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DOI: 10.1109/TVLSI.2003.821553

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type: Journal Article

metadata version: 2022-06-10

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Dongwoo Lee, David T. Blaauw, Dennis Sylvester:
Gate oxide leakage current analysis and reduction for VLSI circuits. IEEE Trans. Very Large Scale Integr. Syst. 12(2): 155-166 (2004)

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