"GAN-OPC: mask optimization with lithography-guided generative adversarial ..."

Haoyu Yang et al. (2018)

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DOI: 10.1145/3195970.3196056

access: closed

type: Conference or Workshop Paper

metadata version: 2019-04-04

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  dblp key:
  - conf/dac/YangLMYY18
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  persistent URL:
  - https://dblp.org/rec/conf/dac/YangLMYY18
Haoyu Yang, Shuhe Li, Yuzhe Ma, Bei Yu, Evangeline F. Y. Young:
GAN-OPC: mask optimization with lithography-guided generative adversarial nets. DAC 2018: 131:1-131:6

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