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"A novel hierarchical approach for proximity effect correction in electron ..."
Kenji Harafuji et al. (1993)
- Kenji Harafuji, Akio Misaka, Noboru Nomura, Masahiro Kawamoto, Hirohiko Yamashita:
A novel hierarchical approach for proximity effect correction in electron beam lithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 12(10): 1508-1514 (1993)
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