"Methodology for standard cell compliance and detailed placement for triple ..."

Bei Yu et al. (2013)

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DOI: 10.1109/ICCAD.2013.6691142

access: closed

type: Conference or Workshop Paper

metadata version: 2018-01-30

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Bei Yu, Xiaoqing Xu, Jhih-Rong Gao, David Z. Pan:
Methodology for standard cell compliance and detailed placement for triple patterning lithography. ICCAD 2013: 349-356

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