"In situ crystallisation in ZrO2 thin films during high ..."

Chao Zhao et al. (2001)

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DOI: 10.1016/S0026-2714(01)00055-5

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type: Journal Article

metadata version: 2022-10-02

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Chao Zhao, Gert Roebben, Hugo Bender, Edward Young, S. Haukka, Michel Houssa, Mohamed Naili, Stefan De Gendt, Marc M. Heyns, Omer Van der Biest:
In situ crystallisation in ZrO₂ thin films during high temperature X-ray diffraction. Microelectron. Reliab. 41(7): 995-998 (2001)

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